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X-ray-Induced Scintillation Properties of Nd-Doped Bi 4 Si 3 O 12 Crystals in Visible and Near-Infrared Regions.

Authors :
Ichiba, Kensei
Okazaki, Kai
Takebuchi, Yuma
Kato, Takumi
Nakauchi, Daisuke
Kawaguchi, Noriaki
Yanagida, Takayuki
Source :
Materials (1996-1944); Dec2022, Vol. 15 Issue 24, p8784, 10p
Publication Year :
2022

Abstract

Undoped, 0.5, 1.0, and 2.0% Nd-doped Bi<subscript>4</subscript>Si<subscript>3</subscript>O<subscript>12</subscript> (BSO) crystals were synthesized by the floating zone method. Regarding photoluminescence (PL) properties, all samples had emission peaks due to the 6p–6s transitions of Bi<superscript>3+</superscript> ions. In addition, the Nd-doped samples had emission peaks due to the 4f–4f transitions of Nd<superscript>3+</superscript> ions as well. The PL quantum yield of the 0.5, 1.0, and 2.0% Nd-doped samples in the near-infrared range were 67.9, 73.0, and 56.6%, respectively. Regarding X-ray-induced scintillation properties, all samples showed emission properties similar to PL. Afterglow levels at 20 ms after X-ray irradiation of the undoped, 0.5, 1.0, and 2.0% Nd-doped samples were 192.3, 205.9, 228.2, and 315.4 ppm, respectively. Dose rate response functions had good linearity from 0.006 to 60 Gy/h for the 1.0% Nd-doped BSO sample and from 0.03 to 60 Gy/h for the other samples. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
19961944
Volume :
15
Issue :
24
Database :
Complementary Index
Journal :
Materials (1996-1944)
Publication Type :
Academic Journal
Accession number :
161008583
Full Text :
https://doi.org/10.3390/ma15248784