Advances and Challenges in Pulsed Laser Deposition for Complex Material Applications.

10.3390/coatings9050335 11 Fischer D., de la Fuente G.F., Jansen M. A new pulsed laser deposition technique: Scanning multi-component pulsed laser deposition method. In this respect, one should mention (i) scanning multicomponent pulsed laser deposition [[11]], (ii) combined PLD and magnetron sputtering [[12]], (iii) multibeam PLD [[13]], (iv) off-axis PLD [[14]], (v) combinatorial PLD [[15]], and (vi) reactive pulsed laser deposition [[17], [19]]. Various physical vapor deposition (PVD) techniques, such as molecular beam epitaxy, electron beam physical vapor deposition, pulsed laser deposition (PLD), arc discharge, magnetron sputtering and/or ion beam sputtering, are currently used for coating or growing thin films on solid substrates. One should note that the PLD process is based on the capability of laser radiation, usually in the ultraviolet range, to efficiently interact with solid-state or liquid targets, resulting in the congruent ablation of materials from the target surface and subsequent deposition on a substrate. [Extracted from the article]