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Artifact-Free Microstructures in the Interfacial Reaction between Eutectic In-48Sn and Cu Using Ion Milling.

Authors :
Chang, Fu-Ling
Lin, Yu-Hsin
Hung, Han-Tang
Kao, Chen-Wei
Kao, C. R.
Source :
Materials (1996-1944); May2023, Vol. 16 Issue 9, p3290, 14p
Publication Year :
2023

Abstract

Eutectic In-48Sn was considered a promising candidate for low-temperature solder due to its low melting point and excellent mechanical properties. Both Cu<subscript>2</subscript>(In,Sn) and Cu(In,Sn)<subscript>2</subscript> formation were observed at the In-48Sn/Cu interface after 160 °C soldering. However, traditional mechanical polishing produces many defects at the In-48Sn/Cu interface, which may affect the accuracy of interfacial reaction investigations. In this study, cryogenic broad Ar<superscript>+</superscript> beam ion milling was used to investigate the interfacial reaction between In-48Sn and Cu during soldering. The phase Cu<subscript>6</subscript>(Sn,In)<subscript>5</subscript> was confirmed as the only intermetallic compound formed during 150 °C soldering, while Cu(In,Sn)<subscript>2</subscript> formation was proven to be caused by room-temperature aging after soldering. Both the Cu<subscript>6</subscript>(Sn,In)<subscript>5</subscript> and Cu(In,Sn)<subscript>2</subscript> phases were confirmed by EPMA quantitative analysis and TEM selected area electron diffraction. The microstructure evolution and growth mechanism of Cu<subscript>6</subscript>(Sn,In)<subscript>5</subscript> during soldering were proposed. In addition, the Young's modulus and hardness of Cu<subscript>6</subscript>(Sn,In)<subscript>5</subscript> were determined to be 119.04 ± 3.94 GPa and 6.28 ± 0.13 GPa, respectively, suggesting that the doping of In in Cu<subscript>6</subscript>(Sn,In)<subscript>5</subscript> has almost no effect on Young's modulus and hardness. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
19961944
Volume :
16
Issue :
9
Database :
Complementary Index
Journal :
Materials (1996-1944)
Publication Type :
Academic Journal
Accession number :
163687045
Full Text :
https://doi.org/10.3390/ma16093290