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Ferroelectric synaptic devices based on CMOS-compatible HfAlOx for neuromorphic and reservoir computing applications.

Authors :
Kim, Dahye
Kim, Jihyung
Yun, Seokyeon
Lee, Jungwoo
Seo, Euncho
Kim, Sungjun
Source :
Nanoscale; 5/14/2023, Vol. 15 Issue 18, p8366-8376, 11p
Publication Year :
2023

Details

Language :
English
ISSN :
20403364
Volume :
15
Issue :
18
Database :
Complementary Index
Journal :
Nanoscale
Publication Type :
Academic Journal
Accession number :
163699770
Full Text :
https://doi.org/10.1039/d3nr01294h