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Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography.
- Source :
- Proceedings of SPIE; 4/11/2023, Vol. 12498, p124980X-124980X-8, 1p
- Publication Year :
- 2023
Details
- Language :
- English
- ISSN :
- 0277786X
- Volume :
- 12498
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 163951852
- Full Text :
- https://doi.org/10.1117/12.2658324