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Fabrication of NdBa2Cu3O7 − x interface-modified ramp-edge junctions by MOCVD.

Authors :
Nakajima, Y.
Kokubun, H.
Adachi, S.
Tarutani, Y.
Tanabe, K.
Morishita, T.
Iwata, N.
Yamamoto, H.
Source :
Journal of Materials Science; Jun2005, Vol. 40 Issue 11, p2981-2984, 4p
Publication Year :
2005

Abstract

Studies the fabrication of NdBa<subscript>2</subscript>Cu<subscript>3</subscript>O<subscript>7 − x</subscript> interface-modified ramp-edge junctions by metalorganic chemical vapor deposition (MOCVD). Examination of the preparation conditions of 300-nm-thick NBCO films for fabrication of ramp-edge junctions; Fabrication of the NBCO and SAT films separately; Deposition of the high-quality c-axis orientated NBCO films with a thickness of 300 nm.

Details

Language :
English
ISSN :
00222461
Volume :
40
Issue :
11
Database :
Complementary Index
Journal :
Journal of Materials Science
Publication Type :
Academic Journal
Accession number :
17332807
Full Text :
https://doi.org/10.1007/s10853-005-2391-z