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Scheduling a Real-World Photolithography Area With Constraint Programming.
- Source :
- IEEE Transactions on Semiconductor Manufacturing; Nov2023, Vol. 36 Issue 4, p590-598, 9p
- Publication Year :
- 2023
-
Abstract
- This paper studies the problem of scheduling machines in the photolithography area of a semiconductor manufacturing facility. The scheduling problem is characterized as an unrelated parallel machine scheduling problem with machine eligibilities, sequence- and machine-dependent setup times, auxiliary resources and transfer times for the auxiliary resources. Each job requires two auxiliary resources: a reticle and a pod. Reticles are handled in pods and a pod contains multiple reticles. Both reticles and pods are used on multiple machines and a transfer time is required if transferred from one machine to another. A novel constraint programming (CP) approach is proposed and is benchmarked against a mixed-integer programming (MIP) method. The results of the study, consisting of a real-world case study at a global semiconductor manufacturer, demonstrate that the CP approach significantly outperforms the MIP method and produces high-quality solutions for multiple real-world instances, although optimality cannot be guaranteed. [ABSTRACT FROM AUTHOR]
- Subjects :
- CONSTRAINT programming
PHOTOLITHOGRAPHY
SETUP time
MACHINE tools
SCHEDULING
Subjects
Details
- Language :
- English
- ISSN :
- 08946507
- Volume :
- 36
- Issue :
- 4
- Database :
- Complementary Index
- Journal :
- IEEE Transactions on Semiconductor Manufacturing
- Publication Type :
- Academic Journal
- Accession number :
- 173370007
- Full Text :
- https://doi.org/10.1109/TSM.2023.3304517