Regulating ferroelectricity in Hf0.5Zr0.5O2 thin films: Exploring the combined impact of oxygen vacancy and electrode stresses.

MLA

Bai, Mingkai, et al. “Regulating Ferroelectricity in Hf0.5Zr0.5O2 Thin Films: Exploring the Combined Impact of Oxygen Vacancy and Electrode Stresses.” Journal of Applied Physics, vol. 134, no. 17, Nov. 2023, pp. 1–11. EBSCOhost, https://doi.org/10.1063/5.0170657.

APA

Bai, M., Hong, P., Han, R., Chai, J., Zhang, B., Hou, J., Xiong, W., Yang, S., Gao, J., Luo, F., & Huo, Z. (2023). Regulating ferroelectricity in Hf0.5Zr0.5O2 thin films: Exploring the combined impact of oxygen vacancy and electrode stresses. Journal of Applied Physics, 134(17), 1–11. https://doi.org/10.1063/5.0170657

Chicago

Bai, Mingkai, Peizhen Hong, Runhao Han, Junshuai Chai, Bao Zhang, Jingwen Hou, Wenjuan Xiong, et al. 2023. “Regulating Ferroelectricity in Hf0.5Zr0.5O2 Thin Films: Exploring the Combined Impact of Oxygen Vacancy and Electrode Stresses.” Journal of Applied Physics 134 (17): 1–11. doi:10.1063/5.0170657.