Investigating the Effect of Plasma Parameters on the Dielectric Constant of Sicoh Thin Films Grown by PECVD Using Dimethyldimethoxysilane.

Details

Language :

English

ISSN :

10918213

Volume :

MA2023-02

Issue :

1

Database :

Complementary Index

Journal :

ECS Meeting Abstracts

Publication Type :

Periodical

Accession number :

175490351

Full Text :

https://doi.org/10.1149/MA2023-02161175mtgabs