Kinetic Features of Plasma-Chemical Modification of Polyvinylidene Fluoride in Plasma.

Changes in the composition of the surface layer of Nevaflon polyvinylidene fluoride film after treatment in gas discharges of various types (glow, dielectric barrier, corona) have been studied. The influence of the discharge type on the kinetics of etching and surface modification of polyvinylidene fluoride is shown. It has been found that the plasma treatment of polyvinylidene fluoride leads to a change in the modified surface layer of the polymer. [ABSTRACT FROM AUTHOR]