Plasma Bombardment-Induced Amorphization of (TiNbZrCr)N x High-Entropy Alloy Nitride Films.

The (TiNbZrCr)N_x high-entropy nitride films (HENFs) were prepared by high-power pulsed magnetron sputtering (HPPMS). The effect of the N₂ flow rate (F_N) on the HPPMS plasma discharge, film composition, microstructure, residual stress, tribological properties, and corrosion resistance was investigated. Results show that, with the increase in F_N, plasma discharge is enhanced. Firstly, the introduced N atoms react with Ti, Nb, Cr, and Zr to form an FCC nitride phase structure. Then, with the increase in plasma bombardment on the deposited film, the HENFs undergo amorphization to form an FCC+ amorphous structure, accompanied by a decrease in grain size and a change in the preferred orientation from (1 1 1) to (2 0 0). The HENFs deposited at F_N = 8 sccm show the highest hardness of 27.8 GPa. The HENFs deposited at F_N = 12 sccm present the best tribological properties, with a low wear rate of 4.0 × 10⁻⁶ mm³N⁻¹m⁻¹. The corrosion resistance of the (TiNbZrCr)N_x HENFs shows a strong correlation with the amorphous phase. The corrosion resistance of the FCC nitride film is the worst, and the corrosion resistance gradually increases with the amorphous transformation of the film. Based on the above results, nanocomposite high-entropy films can be prepared using HPPMS technology and exhibit excellent, comprehensive performance. [ABSTRACT FROM AUTHOR]