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Preparation and characteristics of the O3+-ion-implanted and femtosecond laser-ablated waveguide in the high-gain Nd3+-doped laser glass.
- Source :
- Journal of Materials Science: Materials in Electronics; May2024, Vol. 35 Issue 13, p1-7, 7p
- Publication Year :
- 2024
-
Abstract
- In the work, the planar and ridge waveguides are fabricated by the combination of ion implantation and femtosecond laser ablation in the high-gain Nd<superscript>3+</superscript>-doped laser glass. The species, energy, and dose of ion implantation are O<superscript>3+</superscript> ion, 6.0 × 10<superscript>6</superscript> eV, and 5.0 × 10<superscript>14</superscript> ions/cm<superscript>2</superscript>, respectively. The pulse energy and the scanning velocity are 3 μJ and 50 μm/s for the FS laser ablation. The m-line curve and the refractive index distribution of the planar waveguide are got via a prism coupler and a reflection calculation method, respectively. The refractive index in waveguide core is increased by 2.3 × 10<superscript>–3</superscript> through the O<superscript>3+</superscript> ion irradiation. The microscope images and near-field intensity distributions for both planar and ridge waveguides are measured by a Nikon microscope and an end-face coupling arrangement, respectively. The cross-sectional dimension of the ridge waveguide is 4.2 μm × 10 μm. It has the potential to explore new dimensions in the field of the active waveguides. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 09574522
- Volume :
- 35
- Issue :
- 13
- Database :
- Complementary Index
- Journal :
- Journal of Materials Science: Materials in Electronics
- Publication Type :
- Academic Journal
- Accession number :
- 177097879
- Full Text :
- https://doi.org/10.1007/s10854-024-12686-2