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Electron Distribution Near the Fast-Ion Track in Silicon.

Authors :
Novikov, N. V.
Chechenin, N. G.
Shirokova, A. A.
Source :
Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques; Apr2024, Vol. 18 Issue 2, p255-263, 9p
Publication Year :
2024

Abstract

In this paper, we propose a model to describe the distribution of electrons near the track of a fast ion. The dependence of the fast-electron flux on time, layer depth, and radial variable is modeled taking into account the statistical weight of each trajectory. The pulse duration in the electron-flux distribution was found to be fractions of ps while the radial size of the cylindrical region, where the transport of fast electrons occurs, reaches tens of angstroms. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10274510
Volume :
18
Issue :
2
Database :
Complementary Index
Journal :
Journal of Surface Investigation: X-Ray, Synchrotron & Neutron Techniques
Publication Type :
Academic Journal
Accession number :
177776631
Full Text :
https://doi.org/10.1134/S1027451024020150