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A High-Power RF Switch IC Using AlGaN/GaN HFETs With Single-Stage Configuration.

Authors :
Ishida, Hidetoshi
Hirose, Yutaka
Murata, Tomohiro
Ikeda, Yoshito
Matsuno, Toshinobu
Inoue, Kaoru
Uemoto, Yasuhiro
Tanaka, Tsuyoshi
Egawa, Takashi
Ueda, Daisuke
Source :
IEEE Transactions on Electron Devices; Aug2005, Vol. 52 Issue 8, p1893-1899, 7p
Publication Year :
2005

Abstract

A high-power single-pole double throw (SPDT) switch IC using AlGaN/GaN heterojunction field-effect transistors (HFETs) is demonstrated for the first time. The reduction of on-resistance (R<subscript>on</subscript>) and off-capacitance (C<subscript>off</subscript>) for AlGaN/GaN HFETs enables the GaN-based switch IC that can be applied for practical RF applications. A novel Si-doping technique is employed to reduce ohmic contact resistance, which successfully reduces the R<subscript>on</subscript>. The C<subscript>off</subscript> of the HFETs on a sapphire substrate is found to be smaller than that on a SiC substrate, together with low cost fabrication. The GaN-based SPDT switch IC with single-stage configuration is designed by using a circuit simulator based on the extracted device parameters. The fabricated SPDT switch IC achieves insertion loss of 0.26 dB and Isolation of 27 dB at 1 GHz, as well as an extremely high-power handling capability of 43 W. This value is 10 times higher than that of typical GaAs-based switch ICs. In addition, the switch IC exhibits low distortion characteristics, where the third-order intercept point of 41 dBm is achieved. The chip size is reduced to 40% as compared with conventional four stage GaAs-based switch ICs by using the single-stage circuit configuration. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00189383
Volume :
52
Issue :
8
Database :
Complementary Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
17782807
Full Text :
https://doi.org/10.1109/TED.2005.851835