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Probing the electric and thermoelectric response of ferroelectric 2H and 3R α-In2Se3.
- Source :
- Applied Physics Letters; 6/17/2024, Vol. 124 Issue 25, p1-7, 7p
- Publication Year :
- 2024
-
Abstract
- Two-dimensional van der Waals ferroelectric materials play an important role in a wide spectrum of semiconductor technologies and device applications. Integration of ferroelectrics into 2D-layered material-based devices is expected to offer intriguing working principles and add desired functionalities for next-generation electronics. Here, we investigate the electric and thermoelectric properties of thin layers of the 2H and 3R polymorphs of α -In<subscript>2</subscript>Se<subscript>3</subscript> embedded in solid-state three-terminal devices. Charge transport measurements reveal a hysteretic behavior that can be ascribed to the effect of ferroelectric polarization at the metal electrode/2D semiconductor interfaces. The thermoelectric investigation of the same devices unveils a well-defined negative signal of the order of 100–200 μ V/K in absolute value for the 2H polymorph, showing a slight modulation as a function of the gate voltage. An analogous but noisy thermoelectric voltage is measured for devices based on the 3R polymorph, where indeed a constant finite transversal offset in the 100 μ V-few mV range is detected, which does not depend on the applied temperature gradient. We argue that these experimental observations are related to a strong residual in-plane ferroelectric polarization in the 3R α -In<subscript>2</subscript>Se<subscript>3</subscript> polymorph thin layer. Our results show that the thermoelectric response is a fine probe of the ferroelectric character of 2D layered α -In<subscript>2</subscript>Se<subscript>3</subscript>. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 124
- Issue :
- 25
- Database :
- Complementary Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 178024006
- Full Text :
- https://doi.org/10.1063/5.0202871