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Probing the electric and thermoelectric response of ferroelectric 2H and 3R α-In2Se3.

Authors :
Rahimi, M.
Sobnath, K.
Chen, L.
Mallet, F.
Lafarge, P.
Barraud, C.
Alekhin, A.
Brochard-Richard, C.
Bouaziz, M.
Chaste, J.
Ouerghi, A.
Della Rocca, M. L.
Source :
Applied Physics Letters; 6/17/2024, Vol. 124 Issue 25, p1-7, 7p
Publication Year :
2024

Abstract

Two-dimensional van der Waals ferroelectric materials play an important role in a wide spectrum of semiconductor technologies and device applications. Integration of ferroelectrics into 2D-layered material-based devices is expected to offer intriguing working principles and add desired functionalities for next-generation electronics. Here, we investigate the electric and thermoelectric properties of thin layers of the 2H and 3R polymorphs of α -In<subscript>2</subscript>Se<subscript>3</subscript> embedded in solid-state three-terminal devices. Charge transport measurements reveal a hysteretic behavior that can be ascribed to the effect of ferroelectric polarization at the metal electrode/2D semiconductor interfaces. The thermoelectric investigation of the same devices unveils a well-defined negative signal of the order of 100–200 μ V/K in absolute value for the 2H polymorph, showing a slight modulation as a function of the gate voltage. An analogous but noisy thermoelectric voltage is measured for devices based on the 3R polymorph, where indeed a constant finite transversal offset in the 100 μ V-few mV range is detected, which does not depend on the applied temperature gradient. We argue that these experimental observations are related to a strong residual in-plane ferroelectric polarization in the 3R α -In<subscript>2</subscript>Se<subscript>3</subscript> polymorph thin layer. Our results show that the thermoelectric response is a fine probe of the ferroelectric character of 2D layered α -In<subscript>2</subscript>Se<subscript>3</subscript>. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
124
Issue :
25
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
178024006
Full Text :
https://doi.org/10.1063/5.0202871