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Structural characterization of threading dislocation in α-Ga2O3 thin films on c- and m-plane sapphire substrates.

Authors :
Takane, Hitoshi
Konishi, Shinya
Hayasaka, Yuichiro
Ota, Ryo
Wakamatsu, Takeru
Isobe, Yuki
Kaneko, Kentaro
Tanaka, Katsuhisa
Source :
Journal of Applied Physics; 7/14/2024, Vol. 136 Issue 2, p1-9, 9p
Publication Year :
2024

Abstract

We discuss the structure of threading dislocations in α-Ga<subscript>2</subscript>O<subscript>3</subscript> thin films grown on c- and m-plane sapphire substrates. The thickness-dependent threading dislocation density in both films directly affects the electrical properties of the films including carrier concentration and mobility. Two distinct types of threading dislocations are identified for each of the c- and m-plane α-Ga<subscript>2</subscript>O<subscript>3</subscript> thin films. The c-plane α-Ga<subscript>2</subscript>O<subscript>3</subscript> thin film shows Burgers vectors of 1 / 3 [ 1 1 ¯ 01 ] and 1 / 3 [ 11 2 ¯ 0 ] , while the m-plane α-Ga<subscript>2</subscript>O<subscript>3</subscript> thin film displays Burgers vectors of 1 / 3 [ 2 1 ¯ 1 ¯ 0 ] and 1 / 3 [ 1 1 ¯ 01 ]. This paper presents a detailed structure of the threading dislocations in α-Ga<subscript>2</subscript>O<subscript>3</subscript>, which has been little disclosed thus far mainly due to the difficulty in synthesizing the metastable α-Ga<subscript>2</subscript>O<subscript>3</subscript>. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
136
Issue :
2
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
178423569
Full Text :
https://doi.org/10.1063/5.0206863