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Electrical, structural, morphological and photovoltaic properties of Au/n-Ge heterojunctions using V2O5 interfacial layer.

Authors :
Henry Thomas, G.
Ashok Kumar, A.
Kaleemulla, S.
Rajagopal Reddy, V.
Source :
Journal of Materials Science: Materials in Electronics; Jul2024, Vol. 35 Issue 19, p1-15, 15p
Publication Year :
2024

Abstract

Influence of vanadium pentoxide (V<subscript>2</subscript>O<subscript>5</subscript>) interfacial layer on electrical, structural, morphological and photovoltaic properties of the Au/V<subscript>2</subscript>O<subscript>5</subscript>/n-Ge Schottky diodes is presented. The analysis of morphological properties of the V<subscript>2</subscript>O<subscript>5</subscript> thin films on the n-Ge surface using AFM and FESEM with EDS reveals the films are homogeneous. The AFM measurements of V<subscript>2</subscript>O<subscript>5</subscript> thin films show a fairly smooth surface with RMS roughness of 2.44 nm. Further, the FESEM with EDS measurements of the V<subscript>2</subscript>O<subscript>5</subscript>/n-Ge layers evidenced with V, O and Ge elements signifies the presence of V<subscript>2</subscript>O<subscript>5</subscript> thin films on the n-Ge substrate. The structural properties of V<subscript>2</subscript>O<subscript>5</subscript> deposited on the n-Ge substrate were studied from XRD and Raman measurements. These properties of V<subscript>2</subscript>O<subscript>5</subscript> films reveal that the films were highly crystalline with orthorhombic structure and significant diffraction intensity corresponds to V<subscript>2</subscript>O<subscript>5</subscript> with various crystal orientations. The electrical properties of the n-Ge heterostructure were studied with and without V<subscript>2</subscript>O<subscript>5</subscript> thin interlayer. The Schottky barrier parameters such as barrier height and shunt resistance seem to be superior for the V<subscript>2</subscript>O<subscript>5</subscript>/n-Ge heterojunction compared to without V<subscript>2</subscript>O<subscript>5</subscript> interlayer. The current conduction mechanism of the V<subscript>2</subscript>O<subscript>5</subscript>/n-Ge heterojunction signifies SCLC current transport process assisted with traps is found to be dominant at the V<subscript>2</subscript>O<subscript>5</subscript>–Ge interface preferably at large forward bias voltages. Frequency-dependent capacitance and series resistance of the V<subscript>2</subscript>O<subscript>5</subscript>/n-Ge heterojunction and Au/Ge junction are presented. The photovoltaic property of heterojunction was studied under illumination at 100 mW cm<superscript>−2</superscript> and the studies show a responsivity of 534 mA W<superscript>−1</superscript> at –1 V. In view of these observations, the V<subscript>2</subscript>O<subscript>5</subscript> interlayer has demonstrated its effectiveness in tuning the barrier characteristics of metal-Ge Schottky junctions. Its photoresponse to illumination also makes its suitability in solar cell of photovoltaic applications. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09574522
Volume :
35
Issue :
19
Database :
Complementary Index
Journal :
Journal of Materials Science: Materials in Electronics
Publication Type :
Academic Journal
Accession number :
178495978
Full Text :
https://doi.org/10.1007/s10854-024-13038-w