Patent Application Titled "Laser Processing Method And Laser Processing System" Published Online (USPTO 20240269769).

A patent application titled "Laser Processing Method And Laser Processing System" has been published online by the US Patent and Trademark Office. The patent application, filed by inventor Takashi Onose, relates to a laser processing method and system for improving the resolution of semiconductor exposure apparatuses. The method involves concentrating laser light on the front and bottom surfaces of a workpiece to form a recessed portion, with specific fluence requirements. The patent application was assigned to Gigaphoton Inc. and provides detailed claims and technical information about the laser processing method and system. [Extracted from the article]