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HfAlOx-based ferroelectric memristor for nociceptor and synapse functions.

Authors :
Ju, Dongyeol
Park, Yongjin
Noh, Minseo
Koo, Minsuk
Kim, Sungjun
Source :
Journal of Chemical Physics; 8/28/2024, Vol. 161 Issue 8, p1-12, 12p
Publication Year :
2024

Abstract

Efficient data processing is heavily reliant on prioritizing specific stimuli and categorizing incoming information. Within human biological systems, dorsal root ganglions (particularly nociceptors situated in the skin) perform a pivotal role in detecting external stimuli. These neurons send warnings to our brain, priming it to anticipate potential harm and prevent injury. In this study, we explore the potential of using a ferroelectric memristor device structured as a metal–ferroelectric–insulator–semiconductor as an artificial nociceptor. The aim of this device is to electrically receive external damage and interpret signals of danger. The TiN/HfAlO<subscript>x</subscript> (HAO)/HfSiO<subscript>x</subscript> (HSO)/n<superscript>+</superscript> Si configuration of this device replicates the key functions of a biological nociceptor. The emulation includes crucial aspects, such as threshold reactivity, relaxation, no adaptation, and sensitization phenomena known as "allodynia" and "hyperalgesia." Moreover, we propose establishing a connection between nociceptors and synapses by training the Hebbian learning rule. This involves exposing the device to injurious stimuli and using this experience to enhance its responsiveness, replicating synaptic plasticity. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00219606
Volume :
161
Issue :
8
Database :
Complementary Index
Journal :
Journal of Chemical Physics
Publication Type :
Academic Journal
Accession number :
179372642
Full Text :
https://doi.org/10.1063/5.0224896