Erratum: "Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing" [J. Chem. Phys. 157, 084706 (2022)].

MLA

Huber, Max, et al. “Erratum: ‘Modeling the Temporal Evolution and Stability of Thin Evaporating Films for Wafer Surface Processing’ [J. Chem. Phys. 157, 084706 (2022)].” Journal of Chemical Physics, vol. 161, no. 13, Oct. 2024, p. 1. EBSCOhost, https://doi.org/10.1063/5.0237668.

APA

Huber, M., Hu, X., Zienert, A., Schuster, J., & Schulz, S. E. (2024). Erratum: “Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing” [J. Chem. Phys. 157, 084706 (2022)]. Journal of Chemical Physics, 161(13), 1. https://doi.org/10.1063/5.0237668

Chicago

Huber, Max, Xiao Hu, Andreas Zienert, Jörg Schuster, and Stefan E. Schulz. 2024. “Erratum: ‘Modeling the Temporal Evolution and Stability of Thin Evaporating Films for Wafer Surface Processing’ [J. Chem. Phys. 157, 084706 (2022)].” Journal of Chemical Physics 161 (13): 1. doi:10.1063/5.0237668.