A Low-Hydroxyl Quartz Glass Prepared by Using a Plasma Heat Source as the Flame and High-Purity Quartz Sand as the Raw Material.

In this paper, a quartz glass with low hydroxyl groups was prepared by combining the advantages of various processes, using a plasma heat source as the flame and high-purity quartz sand as the raw material. The purity of the quartz sand was 99.997%. The number of air bubbles in the quartz glass prepared using high-purity quartz sand was lower. The hardness and tensile strength of the quartz glass were 737.7–767.1 GPa and 6.88–9.64 MPa, respectively. The hydroxyl content of the sample was only 4.11 ppm, and the hydroxyl content of the homogenized quartz glass was reduced to 2.64 ppm, which was an improvement of about 35%. After homogenization, the fictive temperature (T_f) of the quartz glass was determined to be 1253 cm⁻¹, and the variation of the T_f value along the radial direction was reduced, indicating a more homogeneous glass structure. The stress distribution in the quartz glass was significantly improved. These results indicate that the preparation of quartz glass from high-purity quartz sand using a plasma heat source as the flame opens up new avenues for optical applications. [ABSTRACT FROM AUTHOR]