Nonchemically amplified molecular resist based on multi-sulfonium modified triptycene for electron beam and extreme ultraviolet lithography.

Details

Language :

English

ISSN :

27088340

Volume :

23

Issue :

3

Database :

Complementary Index

Journal :

Journal of Micro/Nanopatterning, Materials & Metrology (JM3)

Publication Type :

Academic Journal

Accession number :

180298235

Full Text :

https://doi.org/10.1117/1.JMM.23.3.034601