Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum.

MLA

Kokkonen, E., et al. “Ambient Pressure X-Ray Photoelectron Spectroscopy Study on the Initial Atomic Layer Deposition Process of Platinum.” Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 42, no. 6, Dec. 2024, pp. 1–8. EBSCOhost, https://doi.org/10.1116/6.0003871.

APA

Kokkonen, E., Nieminen, H.-E., Rehman, F., Miikkulainen, V., Putkonen, M., Ritala, M., Huotari, S., Schnadt, J., & Urpelainen, S. (2024). Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 42(6), 1–8. https://doi.org/10.1116/6.0003871

Chicago

Kokkonen, E., H.-E. Nieminen, F. Rehman, V. Miikkulainen, M. Putkonen, M. Ritala, S. Huotari, J. Schnadt, and S. Urpelainen. 2024. “Ambient Pressure X-Ray Photoelectron Spectroscopy Study on the Initial Atomic Layer Deposition Process of Platinum.” Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 42 (6): 1–8. doi:10.1116/6.0003871.