Plasma Etch of IGZO Thin Film and IGZO/SiO2 Interface Diffusion in Inductively Coupled CH4/Ar Plasmas.

Details

Language :

English

ISSN :

10918213

Volume :

MA2024

Issue :

2

Database :

Complementary Index

Journal :

ECS Meeting Abstracts

Publication Type :

Periodical

Accession number :

181797143

Full Text :

https://doi.org/10.1149/MA2024-02201788mtgabs