Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.

MLA

Bottacchiari, Rita, et al. “Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.” Coatings (2079-6412), vol. 14, no. 12, Dec. 2024, p. 1551. EBSCOhost, https://doi.org/10.3390/coatings14121551.

APA

Bottacchiari, R., Borgese, L., Paglia, L., Pedrizzetti, G., Marra, F., & Pulci, G. (2024). Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique. Coatings (2079-6412), 14(12), 1551. https://doi.org/10.3390/coatings14121551

Chicago

Bottacchiari, Rita, Laura Borgese, Laura Paglia, Giulia Pedrizzetti, Francesco Marra, and Giovanni Pulci. 2024. “Carbon-Phenolic Ablators Modified by Ceramic Nanofilms Deposited via Atomic Layer Deposition (ALD) Technique.” Coatings (2079-6412) 14 (12): 1551. doi:10.3390/coatings14121551.