Investigating pathways for deep-UV photolithography of large-area nanopost-based metasurfaces with high feature-size contrast.

MLA

Palatnick, Skyler, et al. “Investigating Pathways for Deep-UV Photolithography of Large-Area Nanopost-Based Metasurfaces with High Feature-Size Contrast.” Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, vol. 42, no. 6, Dec. 2024, pp. 1–21. EBSCOhost, https://doi.org/10.1116/6.0003947.

APA

Palatnick, S., John, D., & Millar-Blanchaer, M. (2024). Investigating pathways for deep-UV photolithography of large-area nanopost-based metasurfaces with high feature-size contrast. Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, 42(6), 1–21. https://doi.org/10.1116/6.0003947

Chicago

Palatnick, Skyler, Demis John, and Maxwell Millar-Blanchaer. 2024. “Investigating Pathways for Deep-UV Photolithography of Large-Area Nanopost-Based Metasurfaces with High Feature-Size Contrast.” Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics 42 (6): 1–21. doi:10.1116/6.0003947.