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Invariant representation learning via decoupling style and spurious features.

Authors :
Li, Ruimeng
Pu, Yuanhao
Li, Zhaoyi
Wu, Chenwang
Xie, Hong
Lian, Defu
Source :
Machine Learning; Feb2025, Vol. 114 Issue 2, p1-20, 20p
Publication Year :
2025

Abstract

This paper considers the out-of-distribution (OOD) generalization problem under the setting that both style distribution shift and spurious features exist and domain labels are missing. This setting frequently arises in real-world applications and is underlooked because previous approaches mainly handle either of these two factors. The critical challenge is decoupling style and spurious features in the absence of domain labels. We propose a structural causal model (SCM) for the image generation process to address this challenge, considering both style distribution shifts and spurious features. The proposed SCM enables us to design a new framework called IRSS, which can gradually separate style distribution and spurious features from images by introducing adversarial neural networks and multi-environment optimization, thus achieving OOD generalization. Moreover, it does not require additional supervision (e.g., domain labels) other than the images and their corresponding labels. Experiments on benchmark datasets demonstrate that IRSS outperforms traditional OOD methods and solves the problem of Invariant risk minimization degradation, enabling the extraction of invariant features under distribution shift. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
08856125
Volume :
114
Issue :
2
Database :
Complementary Index
Journal :
Machine Learning
Publication Type :
Academic Journal
Accession number :
182539700
Full Text :
https://doi.org/10.1007/s10994-024-06730-9