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Si-based magnetic tunnel transistor with single CoFe base layer.

Authors :
Jang, S. H.
Kim, Y. W.
Lee, J. H.
Kim, K. Y.
Source :
Journal of Applied Physics; 11/1/2005, Vol. 98 Issue 9, p094502, 4p, 1 Diagram, 4 Graphs
Publication Year :
2005

Abstract

Magnetic tunnel transistors were prepared on Si(100) substrates by magnetron sputter deposition. By means of spin filtering through a single Co<subscript>90</subscript>Fe<subscript>10</subscript> base layer, magnetocurrent ratios of 53%–55% and high transfer ratios of (1–2)×10<superscript>-4</superscript> for emitter-base bias of 1.5–2 V were obtained at 77 K. The bias dependence of the collector current showed the square-law behavior. From the modified Bell-Kaiser model, attenuation lengths of majority and minority spins of hot electrons are expected as 40±5 and 16±1 Å in the single Co<subscript>90</subscript>Fe<subscript>10</subscript> layer, respectively. The decrease of transfer ratio was observed with decreasing base thickness from 80 to 30 Å, which may be related to the extension of the (Co<subscript>2</subscript>Si and Fe) intermediate region formed at Co<subscript>90</subscript>Fe<subscript>10</subscript>/Si interface in the thinner base layer. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
98
Issue :
9
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
18905085
Full Text :
https://doi.org/10.1063/1.2126124