Metal-organic chemical-vapor deposition of high-reflectance III-nitride distributed Bragg reflectors on Si substrates.

MLA

Mastro, M. A., et al. “Metal-Organic Chemical-Vapor Deposition of High-Reflectance III-Nitride Distributed Bragg Reflectors on Si Substrates.” Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 24, no. 4, July 2006, pp. 1631–34. EBSCOhost, https://doi.org/10.1116/1.2172937.

APA

Mastro, M. A., Holm, R. T., Bassim, N. D., Gaskill, D. K., Culbertson, J. C., Fatemi, M., Eddy Jr., C. R., Henry, R. L., & Twigg, M. E. (2006). Metal-organic chemical-vapor deposition of high-reflectance III-nitride distributed Bragg reflectors on Si substrates. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 24(4), 1631–1634. https://doi.org/10.1116/1.2172937

Chicago

Mastro, M. A., R. T. Holm, N. D. Bassim, D. K. Gaskill, J. C. Culbertson, M. Fatemi, C. R. Eddy Jr., R. L. Henry, and M. E. Twigg. 2006. “Metal-Organic Chemical-Vapor Deposition of High-Reflectance III-Nitride Distributed Bragg Reflectors on Si Substrates.” Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 24 (4): 1631–34. doi:10.1116/1.2172937.