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Persistent photoconductivity in p-type ZnO(N) grown by molecular beam epitaxy.
- Source :
- Applied Physics Letters; 3/26/2007, Vol. 90 Issue 13, p132103-1, 3p, 1 Chart, 4 Graphs
- Publication Year :
- 2007
-
Abstract
- Current transport mechanisms and persistent photoconductivity effects were studied in nitrogen-doped ZnO films grown by molecular beam epitaxy having p-type or n-type conductivity at 25 °C. In both types of samples the current flow is determined by the n-type channels surrounded by higher resistivity regions. The persistent photoconductivity wave form is reasonably described by the stretched-exponents-type expression, with only a slight temperature dependence of the characteristic decay time. The persistent photocurrent decay process is greatly accelerated by infrared illumination (threshold energy of the photons ∼1.4 eV). The results suggest that the Fermi level in the higher resistivity regions is pinned near E<subscript>v</subscript>+1.9±0.1 eV and the height of the potential barrier for electrons in the n-type channels is around 1.4±0.1 eV. [ABSTRACT FROM AUTHOR]
- Subjects :
- PHOTOCONDUCTIVITY
NITROGEN
MOLECULAR beam epitaxy
TEMPERATURE
PHOTONS
ELECTRONS
Subjects
Details
- Language :
- English
- ISSN :
- 00036951
- Volume :
- 90
- Issue :
- 13
- Database :
- Complementary Index
- Journal :
- Applied Physics Letters
- Publication Type :
- Academic Journal
- Accession number :
- 24721217
- Full Text :
- https://doi.org/10.1063/1.2717089