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Oxygen ion-implanted optical channel waveguides in Nd?:?MgO?:?LiNbO3: fabrication, characterization and simulation.
- Source :
- Journal of Physics D: Applied Physics; Oct2007, Vol. 40 Issue 19, p5824-5827, 4p
- Publication Year :
- 2007
-
Abstract
- x-cut Nd : MgO : LiNbO3 wafers are implanted with 3 MeV O+ ions at a dose of 6 × 1014 cm[?]2, directly using a photoresist mask consisting of a series of open stripes of width 10 µm. The extraordinary refractive index (RI) experiences positive changes with respect to the bulk after ion bombardment and post-implantation annealing; therefore, channel waveguide structures are formed in the implanted regions. The near field intensity distributions of the transverse-electric modes are obtained by an end-fire coupling arrangement. The modal simulation result shows the reasonableness of the reconstructed RI profiles, which is helpful in designing practical waveguide devices produced by the ion implantation technique. [ABSTRACT FROM AUTHOR]
- Subjects :
- ION implantation
WAVEGUIDES
PHOTORESISTS
REFRACTIVE index
Subjects
Details
- Language :
- English
- ISSN :
- 00223727
- Volume :
- 40
- Issue :
- 19
- Database :
- Complementary Index
- Journal :
- Journal of Physics D: Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 27011992
- Full Text :
- https://doi.org/10.1088/0022-3727/40/19/004