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Optical band gap of BiFeO3 grown by molecular-beam epitaxy.

Authors :
Ihlefeld, J. F.
Podraza, N. J.
Liu, Z. K.
Rai, R. C.
Xu, X.
Heeg, T.
Chen, Y. B.
Li, J.
Collins, R. W.
Musfeldt, J. L.
Pan, X. Q.
Schubert, J.
Ramesh, R.
Schlom, D. G.
Source :
Applied Physics Letters; 4/7/2008, Vol. 92 Issue 14, p142908, 3p, 3 Graphs
Publication Year :
2008

Abstract

BiFeO<subscript>3</subscript> thin films have been deposited on (001) SrTiO<subscript>3</subscript> substrates by adsorption-controlled reactive molecular-beam epitaxy. For a given bismuth overpressure and oxygen activity, single-phase BiFeO<subscript>3</subscript> films can be grown over a range of deposition temperatures in accordance with thermodynamic calculations. Four-circle x-ray diffraction reveals phase-pure, epitaxial films with ω rocking curve full width at half maximum values as narrow as 29 arc sec (0.008°). Multiple-angle spectroscopic ellipsometry reveals a direct optical band gap at 2.74 eV for stoichiometric as well as 5% bismuth-deficient single-phase BiFeO<subscript>3</subscript> films. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00036951
Volume :
92
Issue :
14
Database :
Complementary Index
Journal :
Applied Physics Letters
Publication Type :
Academic Journal
Accession number :
31739320
Full Text :
https://doi.org/10.1063/1.2901160