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Crystalline and dielectric properties of sputter deposited PbTiO3 thin films.

Authors :
Dahl, Ø.
Grepstad, J. K.
Tybell, T.
Source :
Journal of Applied Physics; Jun2008, Vol. 103 Issue 11, p114112, 8p, 2 Diagrams, 9 Graphs
Publication Year :
2008

Abstract

The crystalline and dielectric properties of sputter deposited PbTiO<subscript>3</subscript> thin films were investigated as a function of the film thickness and growth temperature. The crystalline quality was found to be independent of the film thickness from 2.4 to 200 nm. The capacitance of 0.12 mm<superscript>2</superscript> Pt/PbTiO<subscript>3</subscript>/SrRuO<subscript>3</subscript> and Pt/PbTiO<subscript>3</subscript>/Nb:SrTiO<subscript>3</subscript> capacitors was found to deviate from the ideal parallel plate capacitance for PbTiO<subscript>3</subscript> films thinner than 10 nm. The decrease in capacitance was consistent with field penetration into the electrodes. The surface Pb content, as determined from x-ray photoelectron spectroscopy, was found to decrease with increasing growth temperature from 700 to 760 °C. However, no change could be observed in the crystalline quality. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00218979
Volume :
103
Issue :
11
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
32635081
Full Text :
https://doi.org/10.1063/1.2937251