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Crystalline and dielectric properties of sputter deposited PbTiO3 thin films.
- Source :
- Journal of Applied Physics; Jun2008, Vol. 103 Issue 11, p114112, 8p, 2 Diagrams, 9 Graphs
- Publication Year :
- 2008
-
Abstract
- The crystalline and dielectric properties of sputter deposited PbTiO<subscript>3</subscript> thin films were investigated as a function of the film thickness and growth temperature. The crystalline quality was found to be independent of the film thickness from 2.4 to 200 nm. The capacitance of 0.12 mm<superscript>2</superscript> Pt/PbTiO<subscript>3</subscript>/SrRuO<subscript>3</subscript> and Pt/PbTiO<subscript>3</subscript>/Nb:SrTiO<subscript>3</subscript> capacitors was found to deviate from the ideal parallel plate capacitance for PbTiO<subscript>3</subscript> films thinner than 10 nm. The decrease in capacitance was consistent with field penetration into the electrodes. The surface Pb content, as determined from x-ray photoelectron spectroscopy, was found to decrease with increasing growth temperature from 700 to 760 °C. However, no change could be observed in the crystalline quality. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 103
- Issue :
- 11
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 32635081
- Full Text :
- https://doi.org/10.1063/1.2937251