Cite
In-Situ Detection of Plasma Processing Equipment Using a V-Mask Control Chart.
MLA
Baik, SungWook, et al. “In-Situ Detection of Plasma Processing Equipment Using a V-Mask Control Chart.” Materials & Manufacturing Processes, vol. 24, no. 12, Dec. 2009, pp. 1418–22. EBSCOhost, https://doi.org/10.1080/10426910903343957.
APA
Baik, S., Kim, W., & Kim, B. (2009). In-Situ Detection of Plasma Processing Equipment Using a V-Mask Control Chart. Materials & Manufacturing Processes, 24(12), 1418–1422. https://doi.org/10.1080/10426910903343957
Chicago
Baik, SungWook, Woosuk Kim, and Byungwhan Kim. 2009. “In-Situ Detection of Plasma Processing Equipment Using a V-Mask Control Chart.” Materials & Manufacturing Processes 24 (12): 1418–22. doi:10.1080/10426910903343957.