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Effects of Rapid Thermal Annealing on the Device Characteristics of Quantum Well Infrared Photodetectors.

Authors :
Sengupta, D.K.
Fang, W
Malin, J.I.
Curtis, A.P.
Horton, T.
Kuo, H.C.
Turnbull, D.
Lin, C.H.
Li, J.
Hsieh, K.C.
Chuang, S.L.
Adesida, I.
Feng, M.
Bishop, S.G
Stillman, G.E.
Gibson, J.M.
Chen, H.
Mazumder, J.
Liu, H.C.
Source :
Journal of Electronic Materials; Jan1997, Vol. 26 Issue 1, p43-51, 9p
Publication Year :
1997

Abstract

The effect of rapid thermal annealing (RTA) on important detector characteristics such as dark current, absolute response, noise, and detectivity is investigated for quantum-well infrared photodetectors (QWIP) operating in the 8–12 µm wavelength regime. A comprehensive set of experiments is conducted on QWIPs fabricated from both as-grown and annealed multiple-quantum-well structures. RTA is done at an anneal temperature of 850°C for 30 s using an SiO<subscript>2</subscript> encapsulant. In general, a decrease in performance is observed for RTA QWIPs when compared to the as-grown detectors. The peak absolute response of the annealed QWIPs is lower by almost a factor of four, which results in a factor of four decrease in quantum efficiency. In addition, a degraded noise performance results in a detectivity which is five times lower than that of QWIPs using asgrown structures. Theoretical calculations of the absorption coefficient spectrum are in excellent agreement with the experimental data. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
03615235
Volume :
26
Issue :
1
Database :
Complementary Index
Journal :
Journal of Electronic Materials
Publication Type :
Academic Journal
Accession number :
50213918
Full Text :
https://doi.org/10.1007/s11664-997-0132-6