Effect of plasma chamber surface for production of highly charged ions from ECRIS.

The effect of the surface of A1[sub 2]O[sub 3] on the beam intensity of highly charged Ar ions is described. To investigate this effect clearly, we directly plated the surface with 20 µm A1[sub 2]O[sub 3] of the Al cylinder (A1[sub 2]O[sub 3] plating method). This cylinder was inserted into the plasma chamber and it covered its inner wall of. We then measured the beam intensity of highly charged Ar ions carefully. By comparing the beam intensity using the A1[sub 2]O[sub 3] plating method and the Al cylinder, it is confirmed that the A1[sub 2]O[sub 3] surface is very effective in increasing the beam intensity of highly charged heavy ions. The best result of 290 eµA of Ar[sup 11+] was obtained by using this method. [ABSTRACT FROM AUTHOR]