Back to Search Start Over

A New Type of Low-ϰ Dielectric Films Based on Polysilsesquioxanes.

Authors :
Su, R.Q.
Müller, T.E.
Procházka, J.
Lercher, J.A.
Source :
Advanced Materials; Oct2002, Vol. 14 Issue 19, p1369-1373, 5p
Publication Year :
2002

Details

Language :
English
ISSN :
09359648
Volume :
14
Issue :
19
Database :
Complementary Index
Journal :
Advanced Materials
Publication Type :
Academic Journal
Accession number :
63813537
Full Text :
https://doi.org/10.1002/1521-4095(20021002)14:19<1369::AID-ADMA1369>3.0.CO;2-I