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A New Type of Low-ϰ Dielectric Films Based on Polysilsesquioxanes.
- Source :
- Advanced Materials; Oct2002, Vol. 14 Issue 19, p1369-1373, 5p
- Publication Year :
- 2002
Details
- Language :
- English
- ISSN :
- 09359648
- Volume :
- 14
- Issue :
- 19
- Database :
- Complementary Index
- Journal :
- Advanced Materials
- Publication Type :
- Academic Journal
- Accession number :
- 63813537
- Full Text :
- https://doi.org/10.1002/1521-4095(20021002)14:19<1369::AID-ADMA1369>3.0.CO;2-I