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Design and analysis of across-chip linewidth variation for printed features at 130 nm and below.

Authors :
Chen, J. Fung
Socha, Robert J.
Puntambekar, Kumar
Wampler, Kurt E.
Caldwell, Roger F.
Dusa, Mircea V.
Love, John C.
Yeric, Greg
Stoner, Brenda
Source :
Proceedings of SPIE; Nov2000, Issue 1, p168-177, 10p
Publication Year :
2000

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65696233
Full Text :
https://doi.org/10.1117/12.386469