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Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process.
- Source :
- Proceedings of SPIE; Nov2005, Issue 1, p757-766, 10p
- Publication Year :
- 2005
Details
- Language :
- English
- ISSN :
- 0277786X
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 65708753
- Full Text :
- https://doi.org/10.1117/12.617212