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Global pattern density effects on low-k trench CDs for sub-65-nm technology nodes.

Authors :
Hsu, Ju-Wang
Shieh, J. H.
Doong, Kelvin Y. Y.
Hung, L. J.
Lin, S. C.
Ting, C. Y.
Jang, S. M.
Young, K. L.
Liang, M. S.
Source :
Proceedings of SPIE; Nov2006, Issue 1, p615205-615205-8, 8p
Publication Year :
2006

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65735702
Full Text :
https://doi.org/10.1117/12.656409