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Defectivity reduction studies for ArF immersion lithography.

Authors :
Matsunaga, Kentaro
Kondoh, Takehiro
Kato, Hirokazu
Kobayashi, Yuuji
Hayasaki, Kei
Ito, Shinichi
Yoshida, Akira
Shimura, Satoru
Kawasaki, Tetsu
Kyoda, Hideharu
Source :
Proceedings of SPIE; Nov2007 Part 2, Issue 1, p65191T-65191T-8, 8p
Publication Year :
2007

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65755270
Full Text :
https://doi.org/10.1117/12.711331