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Source optimization and mask design to minimize MEEF in low k1 lithography.
- Source :
- Proceedings of SPIE; Nov2008 Part 2, Issue 1, p70280T-70280T-11, 11p
- Publication Year :
- 2008
Details
- Language :
- English
- ISSN :
- 0277786X
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 65776385
- Full Text :
- https://doi.org/10.1117/12.793036