Back to Search Start Over

Erasure of poling-induced second-order optical nonlinearities in silica by UV exposure.

Authors :
Dell, John M.
Joyce, Michael J.
Stone, Geoff O.
Source :
Proceedings of SPIE; 11/ 1/1994, Issue 1, p185-193, 9p
Publication Year :
1994

Details

Language :
English
ISSN :
0277786X
Issue :
1
Database :
Complementary Index
Journal :
Proceedings of SPIE
Publication Type :
Conference
Accession number :
65849549
Full Text :
https://doi.org/10.1117/12.188711