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Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process.
- Source :
- Proceedings of SPIE; Nov2009 Part 2, Issue 1, p72740A-72740A-12, 12p
- Publication Year :
- 2009
Details
- Language :
- English
- ISSN :
- 0277786X
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Proceedings of SPIE
- Publication Type :
- Conference
- Accession number :
- 67394792
- Full Text :
- https://doi.org/10.1117/12.814680