Highly fluorinated low-molecular-weight photoresists for optical waveguides.

A series of highly fluorinated polymers were synthesized by copolymerization of 2,3,4,5,6-pentafluorostyrene (PFS) and fluorinated styrene derivate monomer (FSDM). Their chemical structure were confirmed by ¹H NMR, ¹³C NMR, and ¹⁹F NMR spectra. The refractive index and cross-linking density of the polymers can be tuned and controlled by monitoring the feed ratio of comonomers. A series of negative-type low-molecular-weight fluorinated photoresists (NFPs) were prepared by composing of fluorinated polystyrene derivates (FPSDs), diphenyl iodonium salt as a photoacid generator (PAG) and solvent. The polymer films prepared from NFP by photocuring exhibited excellent chemical resistance and thermal stabilities ( T_d ranged from 230.5 to 258.1 °C). A clear negative pattern was obtained through direct UV exposure and chemical development. For waveguides without upper cladding, the propagation loss of the channel waveguides was measured to be 0.25 dB/cm at 1550 nm. © 2010 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2011 [ABSTRACT FROM AUTHOR]