Cite
Fluorine behavior in BF implanted polysilicon films subjected to rapid thermal annealing.
MLA
Chenglu, Lin, et al. “Fluorine Behavior in BF Implanted Polysilicon Films Subjected to Rapid Thermal Annealing.” Journal of Electronics, vol. 7, no. 2, Apr. 1990, pp. 190–93. EBSCOhost, https://doi.org/10.1007/BF02778575.
APA
Chenglu, L., Rushan, N., & Shichang, Z. (1990). Fluorine behavior in BF implanted polysilicon films subjected to rapid thermal annealing. Journal of Electronics, 7(2), 190–193. https://doi.org/10.1007/BF02778575
Chicago
Chenglu, Lin, Ni Rushan, and Zou Shichang. 1990. “Fluorine Behavior in BF Implanted Polysilicon Films Subjected to Rapid Thermal Annealing.” Journal of Electronics 7 (2): 190–93. doi:10.1007/BF02778575.