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Mechanism of low-temperature radiation hardening in alkali halides. I. Single halogen interstitials as the hardening agent at low temperature.
- Source :
- Journal of Applied Physics; Nov1978, Vol. 49 Issue 11, p5452-5456, 5p
- Publication Year :
- 1978
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 49
- Issue :
- 11
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 72865549
- Full Text :
- https://doi.org/10.1063/1.324513