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Nonequilibrium water permeation in SiO2 thin films.

Authors :
Pfeffer, Robert
Lux, Robert
Berkowitz, Harry
Lanford, W. A.
Burman, C.
Source :
Journal of Applied Physics; Jun1982, Vol. 53 Issue 6, p4226-4229, 4p
Publication Year :
1982

Details

Language :
English
ISSN :
00218979
Volume :
53
Issue :
6
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
72898137
Full Text :
https://doi.org/10.1063/1.331247