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Distribution Coefficient of Boron and Phosphorus in Silicon.

Authors :
Huff, H. R.
Digges, T. G.
Cecil, O. B.
Source :
Journal of Applied Physics; Mar1971, Vol. 42 Issue 3, p1235-1236, 2p
Publication Year :
1971

Details

Language :
English
ISSN :
00218979
Volume :
42
Issue :
3
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
73384696
Full Text :
https://doi.org/10.1063/1.1660176