Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates.

Details

Language :

English

ISSN :

10711023

Volume :

23

Issue :

5

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures

Publication Type :

Academic Journal

Accession number :

74323275

Full Text :

https://doi.org/10.1116/1.2019386